InnoPhysics introduces μPlasmaPrint assisted ALD

Innophysics recently achieved succesfull µPlasmaPrint assisted Atomic Layer Deposition (ALD) of titanium dioxide (TiO2) thin films at atmospheric pressure and low temperatures (<50°C). Together with Prof. Kessels and Dr. Creatore from the Plasma & Materials Processing group at the Eindhoven University of Technology, the InnoPhysics equipment has been optimized to enable µPlasma assisted ALD of metal oxides thin films.

 

Atomic layer deposition is based on alternating pulses of a precursor and reactant (2 half-cycles), leading to self-limiting surface reactions with excellent thickness control and layer quality. Innophysics integrated a precursor dosing head in their µPlasmaPrinter which enables spatial µPlasma-assisted ALD. In the first step of the ALD-cycle, the substrate is exposed to the precursor by shifting the precursor dosing head over the substrate. The precursor molecules absorb at the surface in a self-limiting manner, by the limited number of available surface sites. In the second half-cycle, the substrate is treated by µPlasma (O2, N2, Air, etc.) in a patterned manner. In the next ALD-cycle, the substrate is again exposed to the precursor and the precursor molecules absorb only at the area exposed to µPlasma, leading to selective area ALD. 

In order to avoid reactions between the precursor and reactant or with moisture from the environment, both heads (plasma and precursor) are separated from each other and from environment by means of a nitrogen curtain system. 

As proof of concept, titanium dioxide was deposited with the µPlasma-assisted ALD station. Titanium tetra-isopropoxide (TTIP) was chosen as titanium precursor, while O2 µPlasmaPrint served as the oxidant exposure. Self-limiting surface reactions were achieved and XPS measurements showed less than 1% of carbon. The surface was as smooth as pristine silicon wafer and the refractive index was approximately 2.0.

Ultimately the developments will lead to spatially selective deposition of plasma assisted ALD materials in a predefined digital pattern. The accesories to enable μPlasmaPrint assisted ALD can be integrated with the standard μPlasmaPrint equipment. See product details 

InnoPhysics joins REGMED XB

 RB2
InnoPhysics has joined the REGMED XB initiative. REGMED XB aims at three 'moonshot' developments in regenerative medicine: taking steps towards bioengineerd joints, a first subunit of a bioengineered kidney, proof-of-concept therapy for type I diabetes. Innophysics will assisted the researchers to provide solutions where cells meet surfaces.

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KIEM HTSM funding for μPlasmaPrint assisted ALD

Within the pilot KIEM-HTSM, the FOM Foundation has awarded funding to the first two proposals for public-private collaboration projects with SMEs. Prof. Kessels and Dr. Creatore from the Plasma & Materials Processing group at the Eindhoven University of Technology have succesfullly applied for a KIEM HTSM grant entitled Combining micro-plasma printing and atomic layer deposition for patterned ultra-thin film preparation.
In this project

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Collaboration InnoPhysics & Eindhoven University of Technology in patterned plasma-assisted Atomic Layer Deposition and announcement new CSO

Eindhoven, the Netherlands – InnoPhysics B.V. and the Plasma & Materials Processing group (PMP) at the department of Applied Physics of the Eindhoven University of Technology (TU/e) are pleased to announce a collaboration in the field of patterned plasma-assisted atomic layer deposition (ALD). This collaboration is financially supported by the recently approved FOM-NWO KIEM-HTSM project “Combining micro-plasma printing and atomic layer deposition for patterned ultra-thin film preparation”, under the supervision of dr. M. Creatore (TU/e).

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Joint EuroCVD - Baltic ALD

Linköping, Sweden

Presentation title: "Towards selective plasma assisted ALD"

InnoPhysics will present their latest developments regarding the succesful introduction of atmospheric pressure µPlasmaPrint assisted Atomic Layer Deposition.

More information see http://www.eurocvd-balticald2017.se/

Abstract

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Workshop Nano Fabrication, Devices & Met …

Eindhoven, the Netherlands

Presentation title: "Towards selective plasma assisted ALD"

InnoPhysics will present their latest developments regarding the succesful introduction of atmospheric pressure µPlasmaPrint assisted Atomic Layer Deposition.

More information see http://visiondynamics.nl/

Abstract

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Workshop Nano Bio Surfaces & Interfaces …

Leuven, Belgium

Presentation title: "Towards selective plasma assisted ALD"

InnoPhysics will present their latest developments regarding the succesful introduction of atmospheric pressure µPlasmaPrint assisted Atomic Layer Deposition.

More information see http://visiondynamics.nl/

Abstract

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iPlasmaNano

Antwerp, Belgium

Presentation title: "Towards selective plasma assisted ALD"

InnoPhysics will present their latest developments regarding the succesful introduction of atmospheric pressure µPlasmaPrint assisted Atomic Layer Deposition.

More information see http://www.iplasmanano.org/

Abstract

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InnoPhysics B.V.
Fransebaan 592a
5627 JM Eindhoven, the Netherlands
phone +31 (0) 40 248 4774
Chamber of commerce 17 19 4772

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InnoPhysics B.V.
Fransebaan 592a, 5627 JM Eindhoven, the Netherlands
phone +31 (0) 40 248 4774
Chamber of commerce 17 19 4772
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