Innophysics B.V. and the Plasma & Materials Processing group (PMP) at the department of Applied Physics of the Eindhoven University of Technology (TU/e) are pleased to announce a collaboration in the field of patterned plasma-assisted atomic layer deposition.

This collaboration is

supported by the recently approved FOM-NWO KIEM-HTSM project: "Combining µPlasmaPrinting and atomic layer deposition for patterned ultra-thin film preparation". In this project the combination of the µPlasmaPrinting techniques developed by Innophysics with atomic layer deposition (ALD) will be widely investigated at the TU/e. The ultimate goal is to deposit (ultra-)thin patterned high quality films with high level of control in terms of thickness, opto-electrical properties and patterning resolution. 

During this project, the PMP group intends to demonstrate:

1. Local plasma activation of surfaces by the µPlasmaPrinter followed by area selective ALD of transparant conductive oxide (TCO) films. This combination can lead to a fast, simple and low-cost approach for patterned TCOs, which are for example useful for plastic electronics.

2. Directly deposit metal oxides in an ALD-like approach by the use of a modified µPlasmaPrinter. This innovative approach is expected to deliver not only improved film properties, but also enhanced control of film thickness and patterning resolution.