Plasma activated molecules can be used to print nano surface modification. The plasma enables the molecules to react with the surface without the need for elevated surface temperatures, hence even at room temperature the surfaces can be modified. In addition only a few nanometers of the surface is modified by the process.
The gas & precursors used in the µPlasmaPrint process define the type of nano surface modification:
- oxidation and removal of carbo-hydrates from the surfaces,e.g. cleaning, self assembled monolayer (SAM) removal)
- modification of surface chemical groups into e.g. -OH or -NH chemical functionalities
- deposition of thin films through µPlasmaPrint enhanced CVD or ALD
Substrates can be dielectric materials, such as glass, polymers, alumina etc., semiconductors (Si wafers), and metals. The chosen substrate depends on the eventual application.
Both the chemical and physical nature of the surface of the substrate is modified:
- specific chemical functionalities (OH, NH,..)
- wettability (hydrophilic, hydrophobic)
The µPlasmaPrint nano surface modification process is therefore an enabler for subsequent processing technologies.
